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Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

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Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

Name: Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors
Brand: FUNSONIC
Price: 1 USD

Buy cheap Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors product

Brand Name : FUNSONIC

Model Number : FS620

Certification : CE

Place of Origin : CHINA

MOQ : 1 UNIT

Price : Negotation

Payment Terms : T/T, Western Union

Supply Ability : 1000 unit per month

Packaging Details : Packed by Wooden Case

Production Name : Ultrasonic Precision Spraying Machine

Frequency : 60khz

Max Power : 1-15W

Continuous Spraying Volume Max : 20-1200ml/h/pcs，Scalable

Effective Spraying Width : 2-260mm/pcs，Scalable

Spray Uniformity : ≥95%

Solution Viscosity : ≤30cps

Input Voltage : 220V±10%/50-60Hz

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Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

Description:

Micro electronic semiconductor silicon carbide seed crystal thin film ultrasonic coating is an emerging technology that combines the excellent characteristics of silicon carbide with the efficient coating method of ultrasonic spraying.
Due to its high hardness, high thermal conductivity, and excellent chemical stability, silicon carbide is suitable for high-temperature and high-power applications. Micro electronic semiconductor silicon carbide seed crystal thin film ultrasonic coating thin film coating can achieve efficient electrical and thermal conductivity, suitable for various electronic and optoelectronic devices.

Parameters:

Product Type	Ultrasonic Precision Spray Coating Machine Laboratory desktop Type FS310	Intelligent Ultrasonic Precision Coating Machine desktop Type FS620
Spray Nozzle Operating Frequency	20-200KHz	20-200KHz (Normally use 60100110120K)
Nozzle Power	1-15W	1-15W
Continuous Spraying Volume Max	0.01-50ml/min	0.01-50ml/min
Effective Spraying Width	2-100mm	2-100mm
Spray Uniformity	≥95%	≥95%
Solution Conversion Rate	≥95%	≥95%
Dry Film Thickness	20nm-100μm	20nm-100μm
Solution Viscosity	≤30cps	≤30cps
Temperature Range	1-60℃	1-60℃
Atomized Particles (Median Value)	10-45μm (distilled water), determined by the frequency of the nozzle	10-45μm (distilled water), determined by the frequency of the nozzle
Diversion Pressure Max	≤0.10MPA	≤0.15MPA
Input Voltage	220V±10%/50-60Hz	220V±10%/50-60Hz
Exercise Mode	X+Y two axis fully automatic, Z-axis manual adjustment	XYZ three-axis, independently programmable
Control Mode	Micro computer card, 7-inch touch screen+buttons	FUNSONIC spraying control system, PLC control, 13.3-inch full-color touch screen
Control Content	Ultrasonic spraying, liquid supply, heating, ultrasonic dispersion and other systems	Ultrasonic spraying, liquid supply, heating, ultrasonic dispersion and other systems
Liquid Supply Method	Precision injection pump	Precision injection pump
Ultrasonic Dispersion System (Optional)	50ml, 40K, biological grade sampler	20ml or 50ml, 40K, biological grade sampler
Rated Power of Ultrasonic Dispersion System	200W,10A	100W

Application :

1. Electronic devices: In power electronic devices, silicon carbide thin films can improve the efficiency and heat resistance of the devices.
2. Optoelectronic components: In photovoltaic and LED devices, silicon carbide thin films can enhance the photoelectric conversion efficiency.
3. Wear resistant coating: provides wear-resistant and corrosion-resistant protection on mechanical components.

Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors

Product Tags:

ultrasonic coating for microelectronic semiconductors

microelectronic semiconductors ultrasonic spray coating machine

Ultrasonic Coating Of Silicon Carbide Seed Crystal Thin Film For Microelectronic Semiconductors Images

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